표제지
요약
Abstract
목차
제1장 서언 25
1.1. 연구배경 25
1.2. 연구의 필요성 26
1.3. 연구목적 29
1.4. 연구내용 31
제2장 이론적 배경 34
2.1. 양극산화의 역사 34
2.2. 양극산화 처리용 알루미늄 종류 36
2.3. 양극산화 피막의 구조 38
2.4. 알루미늄 양극산화 42
2.4.1. 랙(Rack) 처리 44
2.4.2. 전처리 46
2.4.3. 양극산화 피막처리 52
2.4.4. 착색처리 57
2.4.5. 봉공처리 59
제3장 실험방법 63
3.1. 실험목표 63
3.2. 샘플준비 63
3.3. 화학적 전처리 66
3.3.1. 탈지 66
3.3.2. 알카리 에칭 67
3.3.3. 스머트 제거(중화처리) 68
3.3.4. 산 에칭 68
3.3.5. 2차 스머트 제거 69
3.4. 양극산화 피막 처리 73
3.4.1. 양극산화 처리 74
3.5. 봉공처리 107
3.5.1. 황산법 양극산화 샘플 봉공처리 109
3.5.2. 옥살산법 양극산화 샘플 봉공처리 113
제4장 실험 결과 118
4.1. 측정 시험 120
4.1.1. 산화피막 두께 측정 120
4.1.2. 양극산화 처리 시간 123
4.1.3. 봉공 처리 시간 125
4.1.4. 내전압 측정 125
4.1.5. 표면 조도 측정 127
4.1.6. 표면 경도 측정 130
4.1.7. 내화학성 시험 133
4.1.8. 성분 분석 137
4.2. 측정 결과 139
4.2.1. 양극산화 처리 시간 139
4.2.2. 내전압 측정 결과 140
4.2.3. 표면 조도 측정 결과 141
4.2.4. 비커스 경도 측정 결과 142
4.2.5. 내화학성 시험 결과 143
4.2.6. 결과 및 고찰 145
제5장 결론 150
참고문헌 156
Table 1. Comparison of physical properties of anodization by sulfuric acid and oxalic acid 27
Table 2. Physical and chemical properties of aluminum 35
Table 3. Classification of aluminum alloys 37
Table 4. Chemical composition of aluminum wrought alloy 37
Table 5. Chemical composition of aluminum casting alloy 38
Table 6. Volume change of atoms or ions according to aluminum anodization 41
Table 7. Conditions of chemical degreasing 49
Table 8. Conditions of etching 50
Table 9. Conditions of desmut 50
Table 10. Anodizing by sulfuric acid 54
Table 11. Anodizing by oxalic acid 55
Table 12. Anodizing by chromic acid 56
Table 13. Anodizing by phosphoric acid 57
Table 14. Conditions for metal salt sealing 62
Table 15. Process of degreasing 67
Table 16. Process of alkali etching 67
Table 17. Process of desmut 68
Table 18. Process of acid etching 69
Table 19. Secondary process of desmut 70
Table 20. Conditions and processing time of pre-treatment 72
Table 21. Characteristics of electrolyte temperature 75
Table 22. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -1 77
Table 23. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -2 77
Table 24. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -3 78
Table 25. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -4 78
Table 26. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -5 79
Table 27. Anodizing conditions of 50 μm of the oxide film layer using sulfuric acid 80
Table 28. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -6 81
Table 29. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -7 82
Table 30. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -8 83
Table 31. Anodizing recipes for 50 μm of an oxide film layer using sulfuric acid -9 83
Table 32. Comparison of sulfuric acid electrolytic conditions 85
Table 33. Test of anodizing according to electrolytic temperature 86
Table 34. Test of anodizing according to electrolytic concentration 87
Table 35. Anodizing recipes for 50 μm of an oxide film layer using oxalic acid -1 89
Table 36. Anodizing recipes for 50 μm of an oxide film layer using oxalic acid -2 90
Table 37. Anodizing recipes for 50 μm of an oxide film layer using oxalic acid -3 91
Table 38. Anodizing recipes for 50 μm of an oxide film layer using oxalic acid -4 92
Table 39. Anodizing conditions of 50 μm of the oxide film layer using oxalic acid 93
Table 40. Anodizing conditions of 40 μm oxide film layer using sulfuric acid and 10 μm oxide film layer using oxalic acid 99
Table 41. Anodizing conditions of 30 μm oxide film layer using sulfuric acid and 20 μm oxide film layer using oxalic acid 101
Table 42. Anodizing conditions of 20 μm oxide film layer using sulfuric acid and 30 μm oxide film layer using oxalic acid 103
Table 43. Anodizing conditions of 10 μm oxide film layer using sulfuric acid and 40 μm oxide film layer using oxalic acid 105
Table 44. Test for sealing processing of sulfuric acid anodizing samples -1 110
Table 45. Test for sealing processing of sulfuric acid anodizing samples -2 111
Table 46. Test of sealing temperature 112
Table 47. Test for sealing processing of oxalic acid anodizing samples 113
Table 48. Process of sealing 114
Table 49. Experimental measurement methods of anodizing film properties 120
Table 50. Test equipment for film thickness measurement 121
Table 51. Results of film thickness measurement 122
Table 52. Time spent on anodizing processing 124
Table 53. Time spent on sealing 124
Table 54. Test equipment for breakdown voltage measurement 125
Table 55. Results of breakdown voltage measurement 126
Table 56. Test equipment for surface roughness measurement 127
Table 57. Results of surface roughness measurement 129
Table 58. Test equipment for vickers hardness measurement 131
Table 59. Results of vickers hardness measurement 131
Table 60. Conditions for hydrochloric acid bubble stream test 134
Table 61. Results of 5% HCl bubble stream test 135
Table 62. Results of 36% HCl bubble stream test 136
Table 63. Results of measurement synthesis 145
Table 64. Results of measurement synthesis of two consecutive anodizings 152
Fig. 1. Characteristics of anodizing of sulfuric acid and oxalic acid methods 27
Fig. 2. Manufacturing process of semiconductor 28
Fig. 3. General anodizing 30
Fig. 4. Continuous two types of anodizing 30
Fig. 5. Comparison of anodization 32
Fig. 6. Changes in the structure of the oxide film 39
Fig. 7. Volume change of atoms and ions according to aluminum anodizing 40
Fig. 8. SEM image of oxide film cross section 41
Fig. 9. SEM image of oxide film surface 42
Fig. 10. Process chart of aluminum anodizing 43
Fig. 11. Aluminum rack for anodizing 45
Fig. 12. Titanium rack for anodizing 46
Fig. 13. Change of aluminum anodized film from barrier layer to porous film 53
Fig. 14. Images of aluminum anodizing and sealing treatment 59
Fig. 15. Circular sander machine and sandpaper 64
Fig. 16. Before and after sanding of samples 65
Fig. 17. Al6061-T6 aluminum samples and racking used for anodizing 65
Fig. 18. Process chart of pre-treatment. 70
Fig. 19. Aluminum pre-treatment tank. 71
Fig. 20. Process chart of continuous anodizing -1 95
Fig. 21. Burning of aluminum racks and samples in consecutive anodizings 96
Fig. 22. Burning of titanium racks and samples in consecutive anodizings 96
Fig. 23. Burning of samples in consecutive anodizings 97
Fig. 24. Process chart of continuous anodizing -2 98
Fig. 25. Image of a double layer oxide film 98
Fig. 26. H₂SO₄ electrolytic bath and rectifier controller of aluminum anodizing 106
Fig. 27. H₂C₂O₄ electrolytic bath and rectifier controller of aluminum anodizing. 106
Fig. 28. Image of sealing oxide film 107
Fig. 29. Image of the sealing smut 109
Fig. 30. Image of sealing processing 115
Fig. 31. Image of aluminum anodizing process 117
Fig. 32. Image of anodizing sample 119
Fig. 33. Image of film thickness measurement 121
Fig. 34. Image of cross section of sulfuric acid anodizing 20 μm + oxalic acid anodizing 30 μm 123
Fig. 35. Image of breakdown voltage measurement 126
Fig. 36. Image of surface roughness measurement 128
Fig. 37. Image of vickers hardness measurement 132
Fig. 38. Image of HCl bubble stream test 133
Fig. 39. Image of HCl bubble stream test sample 134
Fig. 40. Analysis of the components of the sulfate anodizing film layer 137
Fig. 41. Analysis of the components of the sulfate anodizing film layer 138
Fig. 42. Time spent on anodizing processing 139
Fig. 43. Results of breakdown voltage measurement 140
Fig. 44. Results of surface roughness measurement 141
Fig. 45. Results of vickers hardness measurement 142
Fig. 46. Results of 5% HCl bubble stream test 144
Fig. 47. Results of 36% HCl bubble stream test 144
Fig. 48. Image of the double layer oxide film formation stage 151