표제지
국문요약
목차
제1장 서론 16
제2장 이론적 배경 20
2.1. 투명전도 산화막 20
2.1.1. N-type TCO 20
2.1.2. P-Type TCO 22
2.1.3. TCO의 도핑 모델 23
2.1.4. ITO의 특성 24
2.1.4.1. ITO의 개요 및 특성 24
2.1.4.2. ITO의 적용분야 31
2.2. 스퍼터링(sputtering) 33
2.2.1. 스퍼터링의 개요 33
2.2.1.1. 이온과 고체 표면과의 반응 34
2.2.1.2. 스퍼터링 원리 36
2.2.1.3. 스퍼터율 (Sputter yield) 39
2.2.2. DC 스퍼터링 48
2.2.2.1. DC 글로우 방전 53
2.2.2.2. 파센 법칙(Pachen's Law) 57
2.2.3. 마그네트론(Magnetron) 스퍼터링 60
2.3. PET film 63
2.3.1. PET film의 특성 63
2.3.1.1. 기계적 특성 64
2.3.1.2. 열적 특성 65
2.3.1.3. 전기적 특성 65
2.3.1.4. 내약품성과 기체 투과성 67
2.3.1.5. 광학적 특성 68
2.4. 터치패널 69
2.4.1. 터치패널의 개요 69
2.4.1.1. 터치패널의 정의 69
2.4.1.2. 터치패널의 장단점 70
2.4.1.3. 터치패널의 종류 72
2.4.1.4. 터치패널의 기술 비교 79
2.4.1.5. 실생활 속에서의 터치패널 적용 분야 81
제3장 ITO/PET film 제조 공정 실험 84
3.1. 실험 장치 구성 및 방법 84
3.1.1. In-line sputter system 84
3.1.2. 기타 측정 장비 86
3.2. PET 기판상에 DC 마그네트론 스퍼터링에 의한 ITO 저항막 형성 최적화 공정 실험 87
3.2.1. Ar gas 대비 O₂ gas 유량변화에 따른 PET film 상의 ITO 저항막 스퍼터링 88
3.2.2. Power 변화에 따른 PET film 상의 ITO 저항막 스퍼터링 96
3.2.3. 공정압력 변화에 따른 PET film 상의 ITO 저항막 스퍼터링 105
3.2.4. PET film 기판의 온도 상승에 따른 ITO 저항막 스퍼터링 111
3.2.5. Glass 기판의 온도 상승에 따른 ITO 저항막 스퍼터링 117
3.2.6. 다양한 공정조건으로 증착된 PET film 상의 ITO 박막의 내열성 실험 122
3.2.6.1. O₂ gas 유량에 따른 PET film 상의 ITO 박막의 내열성 실험 특성 분석 123
3.2.6.2. Power 변화에 따른 PET film 상의 ITO 박막의 내열성 실험 특성 분석 129
3.2.6.3. 공정압력 변화에 따른 PET film 상의 ITO 박막의 내열성 실험 특성 분석 134
제4장 터치패널 제작 및 동작특성 분석 140
4.1. ITO/PET 필름을 이용한 3.5인치 view area를 갖는 4선 저항막 방식 터치패널의 제작 140
4.1.1. 상판 PET film 공정 140
4.1.2. 하판 glass 공정 142
4.1.3. Assembly 공정 145
4.2. O₂ gas 유량에 따른 DC 마그네트론 스퍼터링 된 PET film 상의 ITO 박막 내구성 시험 148
4.3. DC 마그네트론 스퍼터링 된 PET film 상의 ITO 박막을 적용한 터치패널의 선형성 시험 151
4.3.1. 터치패널 제작을 위한 ITO / PET film specification 151
4.3.2. ITO / Glass specification 153
4.3.3. 터치패널의 전압의 선형성 시험 방법 155
제5장 결론 163
참고문헌 165
Abstract 170
발표논문 172
표 2.1. Mechanical properties of PET film 64
표 2.2. Thermal properties of PET film 65
표 2.3. Electrical properties of PET film 66
표 2.4. Chemical and Optical properties of PET film (1) 67
표 2.4. Chemical and Optical properties of PET film (2) 68
표 2.5. Application of touch panels dependent on input type 70
표 2.6. Comparison of touch panels 71
표 2.7. Technology comparison of touch panel 81
표 3.1. Properties of ITO thin film deposited using different O₂ gas 90
표 3.2. Properties of ITO thin film deposited using different power density 98
표 3.3. Properties of ITO thin film deposited using different working pressure 106
표 3.4. Properties of ITO thin film deposited using different substrate temperature 113
표 3.5. Properties of ITO thin film deposited using different glass substrate temperature 118
표 3.6. Properties of optimized ITO PET film DC magnetron sputtering 139
표 4.1. Results of durability of ITO PET film deposited with different O₂ gas 150
표 4.2. Linear properties of the touch panel for X-axis 158
표 4.3. Linear properties of the touch panel for Y-axis 160
Fig. 2.1. Relation to function and carrier density of TCO films 21
Fig. 2.2. Qualitative TCO doping model 24
Fig. 2.3. Reduction of In₂O₃ 25
Fig. 2.4. Substitution of Sn4+ and In3+(이미지참조) 27
Fig. 2.5. Resistivity vs tin concentration in In₂O₃ as a function of oxygen particle pressure 28
Fig. 2.6. Carrier concentration vs tin concentration In₂O₃ as a function of oxygen particle pressure 29
Fig. 2.7. The geometric model of Indium oxide (a) unit cell structure (b) local structure 30
Fig. 2.8. Energetic particle bombardment on surface and growing films 34
Fig. 2.9. Sputtering – the atomic billiards game 36
Fig. 2.10. Interactions of ions with target surface 38
Fig. 2.11. Dependence of the factor α on the mass ratio mi/mt(이미지참조) 40
Fig. 2.12. Three regimes of sputtering by elastic. 41
Fig. 2.13. Threshold sputtering energy versus atomic number of various elements bombarded by Hg+ ions 43
Fig. 2.14. Energy dependence of the sputtering yield of the (111), (100), (110) planes of Ag and polycrystalline Ag targets 45
Fig. 2.15. Sputtering yield for Ni and Au versus incident angle of light ions 45
Fig. 2.16. Sputtering yield of the noble gases on copper 46
Fig. 2.17. Ion energy dependence of sputtering yield for copper bombarded by Ar ions 47
Fig. 2.18. Basic DC sputtering system 48
Fig. 2.19. Effect of the gas pressure on the sputtering yield of Ni bombarded by 150 eV Ar ions 52
Fig. 2.20. Influence of working pressure and current on deposition rate for nonmagnetron sputtering 52
Fig. 2.21. I-V properties curve in DC discharge 54
Fig. 2.22. Pachen's curve of various gas 58
Fig. 2.23. Area and characteristic of DC discharge (a) discharge area (b) potential distribution in discharge tube (c) electric field distribution in discharge tube 59
Fig. 2.24. Applied fields and electron motion in planar magnetron 61
Fig. 2.25. principle of the magnetron effect (a) DC diode system (b) DC magnetron system 62
Fig. 2.26. Schematic of planar magnetron target 62
Fig. 2.27. Types of capacitive touch panel depending on driving method 72
Fig. 2.28. Structure and driving principle of surface type capacitive touch panel 73
Fig. 2.29. Structure and driving principle of mutual type capacitive touch panel 74
Fig. 2.30. Coordinate measurement method of capacitive touch panel 75
Fig. 2.31. Resistive touch panel (a)Structure (b)Driving principle 76
Fig. 2.32. Structure of Infrared radiation(IR) touch panel 77
Fig. 2.33. Driving principle of Infrared radiation(IR) touch panel 78
Fig. 2.34. Structure and driving principle of Surface Acoustic Wave(SAW) touch panel 79
Fig. 3.1. Structure of the In-line sputter system 85
Fig. 3.2. Thin film deposition Process with In-line sputtering 85
Fig. 3.3. Measurement equipment of ITO PET film (a) 4point prove (b) Alpha-Step (c) Hall effect 87
Fig. 3.4. Relation of Oxygen vacancy and Free electron 89
Fig. 3.5. Properties of ITO thin film deposited with different O₂ gas flow rate (a) sheet resistance & resistivity (b) thickness (c) transmittance spectrum (d) average T% and T% at... 92
Fig. 3.6. Properties of ITO thin film deposited with different Power (a) sheet resistance & resistivity (b) thickness (c) transmittance spectrum (d) average T% and T%... 100
Fig. 3.7. Relation of the scattering and the deposition region under different power (h: thermalization distance, β: scattering angle, λ: diffusion region) 103
Fig. 3.8. Properties of ITO thin film deposited with different Pressure (a) sheet resistance & resistivity (b) thickness (c) transmittance spectrum (d) average T% and T% at... 107
Fig. 3.9. Effect of working pressure on the scattering 110
Fig. 3.10. Properties of ITO thin film deposited with different Temperature (a) sheet resistance & resistivity (b) thickness (c) transmittance spectrum (d) average... 114
Fig. 3.11. Properties of ITO thin film deposited with different glass substrate Temperature (a) sheet resistance & resistivity (b) thickness (c) transmittance spectrum... 119
Fig. 3.12. ITO tin films deposited on PET film with various sputtering condition for heat resistance test 122
Fig. 3.13. Heating resistive properties of ITO thin film deposited O₂ gas flow rate (a) 0.5sccm (b) 0.8sccm (c) 1.0sccm (d) 1.2sccm (e) 1.5sccm (f)... 124
Fig. 3.14. Heating resistive properties of ITO thin film deposited Power (a) 1kW (b) 1.5kW (c) 2.0kW (d) 2.5kW (e) 3.0kW (f) (a)~(e) average total... 130
Fig. 3.15. Heating resistive properties of ITO thin film deposited Power (a) 4mTorr (b) 5mTorr (c) 6mTorr (d) 7mTorr (e) 8mTorr (f) (a)~(e)... 135
Fig. 4.1. Process flow for top side PET film of touch panel 140
Fig. 4.2. Process procedure of front side PET film 141
Fig. 4.3. Process flow for rear side glass of touch panel 143
Fig. 4.4. Process procedure of rear side glass 144
Fig. 4.5. Assembly procedure of front and rear panel 146
Fig. 4.6. Assembly procedure and touch panel test using PC 147
Fig. 4.7. (a) Schematic pencil testor (b) Durability test for ITO PET film (c) Image of the pencil testor 149
Fig. 4.8. Results of durability of ITO PET film deposited with different O₂ gas 151
Fig. 4.9. Properties of the electrode screen printed on the ITO PET film 152
Fig. 4.10. Properties of the electrode and dots screen printed on the ITO glass 154
Fig. 4.11. Process finished of the touch panel 155
Fig. 4.12. Linear test of the touch panel 156
Fig. 4.13. Properties of the touch panel linear graph 157
Fig. 4.14. Linear properties of the touch panel for X-axis 159
Fig. 4.15. Linear properties of the touch panel for Y-axis 161
Fig. 4.16. Linear properties of the touch panel for X, Y-axis 162