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논문명/저자명
탄소나노튜브 paste를 이용한 삼극관 구조의 면광원의 제작공정에 관한 연구 = Study of the fabrication process of triode structure with carbon nanotube paste for flat lamp / 정용준 인기도
발행사항
서울 : 성균관대학교 대학원, 2006.8
청구기호
TM 620.11297 ㅈ275ㅌ
형태사항
vi, 60 p. ; 26 cm
자료실
전자자료
제어번호
KDMT1200684534
주기사항
학위논문(석사) -- 성균관대학교 대학원, 전자재료, 2006.8
원문
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title page

Abstract

Contents

CHAPTER 1. Introduction 10

1.1/1. Carbon Nanotube 10

1.1.1/1.1. Structure and General Properties 10

1.1.2/1.2. Characterization of field emission from CNTs 14

1.2. Field emission theory 17

1.3. Back light Unit (BLU) 20

1.3.1. Basic structure of BLU 20

1.3.2. Details of side (wedge) type 23

1.3.3. Function of each component 25

Reference 29

CHAPTER 2. Experiment 31

2.1. Fabrication process of CNT paste 31

CHAPTER 3. Fabrication and characteristic of under-gated triode with CNT emitter for flat lamp 34

3.1. Introduction 34

3.2. Experiment 36

3.3. Results and Discussions 39

3.4. Conclusion 49

References 50

CHAPTER 4. Simple fabrication process of a screen-printed triode-CNT field emitter array 52

1. Introduction 52

2. Experimental 54

3. Results and discussion 57

4. Conclusions 64

References 65

초록 66

List of publications 68

Figure 1-1. Form a single-walled CNT from a graphene sheet. 12

Figure 1-2. Examples of CNTs with different (n, m) indices. 13

Figure 1-3. The typical I-V characteristic of a CNT film and its corresponding F-N plot (inset). 16

Figure 1-4. Schematic illustration of the surface potential barrier under the action of an external electric field. 19

Figure 1-5. Combination of BLU with TFT-LCD panel 20

Figure 1-6. Basic structure of BLU according to light position 22

Figure 1-7. Detail descriptions of side type BLU 24

Figure 1-8. Function and structure of diffusion film. 27

Figure 1-9. Structure and function of prism (lens) film 28

Figure 2-1. The schematic diagram of fabrication procedure of CNT past. 33

Figure 3-1. Schematic diagram of fabrication processes for under-gate type triode with CNT emitters. 38

Figure 3-2. Schematic diagram of simulation domain used in the simulation, (a) diode and (b) triode. The unit is um. 40

Figure 3-3. Simulation results of electric potential distribution and trajectories of emitted electrons near the cathode electrodes under various conditions. 42

Figure 3-4. SEM image of (a) under gate structures and (b) morphologies of CNT-emitter on a cathode electrode after surface activation using adhesive tape. 44

Figure 3-5. I-V curve for under-gate CNT field emitters under diode-type emission where the distance between the anode and cathode is maintained to be 1500㎛. 46

Figure 3-6. I-V characteristics of a under gate type triode with CNT emitters. Anode voltage is 2500V. 48

Figure 4-1. Schematic depiction of fabrication processes for triode structure with CNT emitters. 56

Figure 4-2. Plot of variation in transmission (in %) over the measured wavelength range as a function of thickness of Au layer. 59

Figure 4-3. Plot of variation in sheet resistance and maximum transmittance as a function of Au/Ti layer thickness. 60

Figure 4-4. Recorded SEM image for parallel triode structure and CNT emitters on a cathode electrode after surface activation by adhesive tape. 62

Figure 4-5. Recorded I-V characteristics in triode and diode configuration with CNT emitters.(Anode voltage is 2700V). 63

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