생몰정보
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직위
직업
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title page
Contents
(Abstract) 9
Chapter 1. Introduction 11
1. Preparation of Ti02 using TDMAT and H₂O₂ 12
2. Atomic Layer Deposition (ALD) 13
2.1) The ALD cycle 13
2.2) Benefits and Limitations of ALD 16
2.3) Requirements for ALD precursors 18
2.4) The ALD process window 19
3. Photocatalytic activity of TiO₂ 25
Chapter 2. Experimental 29
1. Film growth and characterization 29
2. Photocatalytic experiment 30
Chapter 3. Results and Discussion 33
1. Film growth 33
2. Film properties and photocatalytic activity of the film 40
2.1) Film properties 40
2.2) Photocatalytic activity 45
Chapter 4. Conclusions 49
References 50
(국문초록) 53
Table 1. Characteristic Features of the ALD with the consequent advantages 16
Table 2. Requirement for ALD precursors 18
Figure 1. ALD cycle in a term of (a) reaction inside reactor (b) flow rate 15
Figure 2. Different growth rate vs pulse time during ALD process 21
Figure 3. Various growth rate vs temperature during ALD process 24
Figure 4. Photocatalytic activity of TiO₂ with various possible path reactions 26
Figure 5. Self-cleaning mechanism of hydrophilic Ti02 thin films 26
Figure 6. Schematic of TiO₂ film deposition system 31
Figure 7. TDMAT precursor structure 31
Figure 8. Schematic of photo reactor 32
Figure 9. Growth rate of film as a function of deposition temperature 35
Figure 10. Growth rate of film as a function of precursor purge time at deposited temperature 200°C 35
Figure 11. Growth rate of film as a function of reactant purge time at deposited temperature 200 °C 36
Figure 12. Growth rate of film as a function of precursor pulse time at deposited temperature 200°C 36
Figure 13. Growth rate of film as a function of reactant pulse time at deposited temperature 200°C 37
Figure 14. Film thickness as a function of number of cycles at deposited temperature 125 and 200°C 37
Figure 15. Cross-sectional SEM micrograph of the TiO₂ film grown at 200°C 39
Figure 16. AES depth profile of the typical TiO₂ films 41
Figure 17. XPS survey data of as deposited 200°C sample after etching 41
Figure 18. AFM picture shows surface roughness of samples a) as deposited 200°C b) postannealing 650°C 42
Figure 19. XRD pattern of TiO₂ film at various conditions 44
Figure 20. The photocatalytic activity of TiO₂ thin films at as various deposited temperatures 48
Figure 21. The photocatalytic activity of TiO₂ thin films at as various annealing temperatures 48
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